WET BENCH HALF AUTO WET CLEAN BENCH TUBE CLEANER PARTS CLEANER DI-WATER HEATER AUTOMATIC ORGANIC STRIP BENCH SPECIFICATION       U/D DRYER F/R HQDR CH2 O/F CH1 L/D   2500×1400×2050mm(W×D×H)   * Generals of device 1. Purpose : This is automatic wafer treatment system which remove oxide on silicon HF, DI.Water and dry it 2. Water size : 4~8" Silicon wafer 3. Treatment : 2 cassette (1 Patch 50 sheets) 4. Cassette : A200-80MG (Flouroware made) 5. Direction : From left to right * Utility