WET BENCH HALF AUTO WET CLEAN BENCH
TUBE CLEANER PARTS CLEANER
DI-WATER HEATER AUTOMATIC ORGANIC STRIP BENCH SPECIFICATION
 
 
  U/D DRYER F/R HQDR CH2 O/F CH1 L/D
  250014002050mm(WDH)
 
* Generals of device
1. Purpose : This is automatic wafer treatment system which remove oxide on silicon
HF, DI.Water and dry it
2. Water size : 4~8" Silicon wafer
3. Treatment : 2 cassette (1 Patch 50 sheets)
4. Cassette : A200-80MG (Flouroware made)
5. Direction : From left to right
* Utility