WET BENCH HALF AUTO WET CLEAN BENCH
TUBE CLEANER PARTS CLEANER
DI-WATER HEATER AUTOMATIC ORGANIC STRIP BENCH SPECIFICATION
 
 
* Generals of device
1. Purpose : This is automatic wafer treatment system which remove PR on silicon
chemical, DI.Water and dry it
2. Water size : 4~8" wafer
3. Treatment : 2 cassette (1 Patch) 50 sheets
4. Cassette : A182-60MG or A182-60MC
5. Direction : From left to right
* Utility