RF deposition system - KCIE,1993
High Resolution optical signal analysis system control & spectrum analysis - KCIE, 1995
Development of slurry supporting equipment - Korea technology finance Co., 1998
Study on analysis of conductive and nonconductive materials with RF gas-jet boosted glow discharge emission spectrometer - KCIE, 1998
Development of RF sputtering optical analysis system using high resolution multi-channel optic technology - KCIE, 1999
Development of high sensitive photo-plasma spectrometry for real-time multi-elemental metal analysis, SMBA, 2001
Development of in-situ movable trace element analysis equipment of water with united remote monitoring technology, KCIE, 2001
Development of Atomic Emission Optional analysis equipment for Component analysis in Biological Samples, SMBA, 2004
 
 
Direct analysis equipment for solid samples using RF glow discharge - Patent Number 0154596, 1998
Direct analysis equipment and method for solid samples using high-frequency glow discharge - Patent Number 0218281, 1999
Excellent Korean Technology Certificate (KT mark) - Depth profiling and multi-element analysis using plasma, Ministry of Science and Technology, 1999
Glow discharge cell with hollow cathode ray tube of spectrometry analyzing system - Patent number 0453293, 2004
Mass analyzing system with ionization unit for sample using gas-jet flow dischage - Patent application number 0437728, 2004
Electro-Thermal Vaporization Device - Patent application number 010411, 2004
Apparatus for Detecting Sample using the Plasma And Method of Detecting Sample using the Same - Patent application number 0112838, 2004