PRODUCT
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PRODUCT
Wet Equipment
Wet Station
Wet Station
HWS-AWS (Cassetteless Type)
· Applicable to various processes as wafer surface cleaning equipment
· Wafer Size : 150mm ~ 200mm
· Process Direction : From left to right / From right to left
· Robot System : 2 ~ 4set [ Robot safety interlock ]
· Front Door : Slide open type
· Chemical Supply : CCSS or LCSS type
· Control method : PC or PLC control / Scheduler control
· Wafer Size : 150mm ~ 200mm
· Process Direction : From left to right / From right to left
· Robot System : 2 ~ 4set [ Robot safety interlock ]
· Front Door : Slide open type
· Chemical Supply : CCSS or LCSS type
· Control method : PC or PLC control / Scheduler control
Application field
- - RCA cleaning
- - Particle removal
- - Nitride film removal
- - Oxide film removal
- - Polymer removal
- - Resist Strip Station
