PRODUCT

고객 만족의 극대화와 내부로의 R&D강화를 동시에
추구하는 기업이 되겠습니다.
제품소개 반도체장비 Wet Station

Wet Station

HWS-AWS (Cassette Type)
· Wafer 표면 세정 설비로 다양한 공정에 대응 가능 하다.
· Wafer Size : 150mm ~ 200mm [ 2Cassette Type ]
· Process Direction : From left to right / From right to left
· Robot System : 2 ~ 4set [ Robot safety interlock ]
· Front Door : Slide open type
· Chemical Supply : CCSS or LCSS type
· Control method : PC or PLC control / Scheduler control

Application field

  • - RCA cleaning
  • - Particle removal
  • - Nitride film removal
  • - Oxide film removal
  • - Polymer removal
  • - Resist Strip Station