Application
· Dry for LSI・Power Device manufacturing
· Dry for LED・Solar cell manufacturing
· Dry for photo mask glass substrates
IMD Features
· Watermark-inhabitable from wet to dry while process in one dosing tank
· IPA Vapor-less used by ordinary temperature IPA Mist
· IPA consumption reduced by 1/10 compare with IPA Vapor dryer
· Respond to wafer with resist which was hard to deal with IPA Vapor dry
· Can handle same dry ability and time compare with carrier-less dry in spite of use of carrier
· Design from Stand-alone to In-line customers' needs