PRODUCT

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PRODUCT Wet Equipment Dryer

Dryer

Y.A.C Mechatronics IPA Film Dryer [ IFD ]

Application

· Dry for LSI・MEMS・Power Device manufacturing

IFD Features

· O₂GAS-LESS inside of dosing tank because processing from wet to dry end in one tank
· Use of low temperature IPA indirecting heated with HOT DIW
· When pass through purity-side, form IPA film on purity-side, DIW → IPA막 → IPA successive substitution
· After IPA film, IPA film → IPA Vapor → IPA condensed substitution by low temperature IPA Vapor
· Since not only give IPA surface tension on wafer, circuit pattern collapse-inhabitable
· Control watermark by IPA Vapor adjusting consistency suitable for wafer side
· Maximize residual particle exclusion effect by IPA film
· Reduce IPA consumption/heater capacity
· Design from Stand-alone to In-line customers' needs